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Thermal Conductivity Measurements of silicon dioxide thin films by 3ω-method (CAT#: STEM-PPA-0034-WXH)
Introduction
Silicon oxide is widely used as a thin film to improve the surface properties of materials, because it is of anti-resistance, hardness, corrosion resistance, dielectric, optical transparency etc. Just as these excellent performances, silicon oxide thin films are used in many fields.
Principle
The process involves a metal heater applied to the sample that is heated periodically. The temperature oscillations thus produced are then measured. The thermal conductivity and thermal diffusivity of the sample can be determined from their frequency dependence.
Applications
Determining the thermal conductivities of bulk material (i.e. solid or liquid) and thin layers
Procedure
1. Sample preparation and mounting
2. Experimental condition setting
3. Experiment start: Turn on the 3ω signal generator and lock-in amplifier, and control the temperature controller to make the sample temperature reach the set value. When the sample reaches a stable state, data acquisition and processing begin.
4. Data processing
2. Experimental condition setting
3. Experiment start: Turn on the 3ω signal generator and lock-in amplifier, and control the temperature controller to make the sample temperature reach the set value. When the sample reaches a stable state, data acquisition and processing begin.
4. Data processing
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