BAWL-06 Wafer Inspection System, 100mm/150mm (CAT#: STEM-AL2-6362-ZJF)

The BAWL-06 Wafer Inspection System is designed for laboratory microscopy, imaging, and optical system integration. The BAWL-06 features and optical imaging system, enabling high-definition capture of micro details on wafers. The source specifies wafer size as 100mm/150mm. The source specifies minimum wafer thickness as 150um. The source specifies eyepiece as PL10X. The product provides the source-described support function within a microscope or digital imaging workflow. Objective dimensions, interfaces, materials, or performance details are retained where they are explicitly stated. The accessory is intended for integration with compatible laboratory equipment.

Wafer Size: 100mm/150mm
Minimum Wafer Thickness: 150um
Eyepiece: PL10X
Viewing head: Trinocular
Objectives: 5X/10X/20X/50X/100X
Illumination: 12V/10W LED
Stage: 6 inches mechanical stage

EFEM system
The EFEM system is equipped with automatic loading and unloading modules and is compatible with various wafer sizes
Open Cassette
Mapping
Using a high-precision optical detection system, wafers are scanned layer by layer to record wafer position information
Cassette Mapping: Standard
Oblique Insertion
High-precision wafer pre-alignment