Plasma Profiling TOFMS, With Depth Profiling Technique, HORIBA Scientific (CAT#: STEM-CA-0013-LKN)

Plasma Profiling TOFMS is manufactured by HORIBA Scientific. This product can provide the function that the chemical composition changes with the depth of the solid material. This depth profiling technique consists of a glow discharge plasma source which erodes and ionizes the sample material coupled to the ultrafast time of flight mass spectrometer. Because the sample does not need to be transferred to a high vacuum chamber, the pre analysis time is greatly shortened and submicron films can be analyzed in a few minutes. The use of RF excitation signals allows analysis of all types of materials, from conductive to non-conductive and from inorganic to hybrid materials. Rapid sample preparation can be used to analyze coatings on flexible substrates. A mass spectrometer coupled with a high intensity plasma source can produce highly sensitive techniques. In addition, due to the separation of sputtering and ionization (low matrix effect), a simple internal calibration calculation can give a semi quantitative result (atomic concentration in the correct order of magnitude).