High-quality products
Reliable performance
The desorption process of silicon oxide (SiO2) can be analyzed by means of ultra-high vacuum (UHV) thermal annealing, molecular beam epitaxy (MBE) continuous growth of thin silicon (Si) layers and non-in-situ secondary ion mass spectrometry (SIMS).
High-quality products
Reliable performance
Wide range of applications
For various laboratory needs
Expert support
Professional service team
Fast delivery
Global shipping