Turbo-V 2K-G Turbomolecular Pump (CAT#: AM-LE-0783-Y)

The Turbo-V 2K-G Turbomolecular Pump is manufactured by Agilent Technologies, it is a special molecular pump system specially designed for plasma sputtering process. The vane stage and the overall structure of the pump can work in a high argon atmosphere and a very high temperature environment, becoming the best pump solution for the coating industry.

Pumping speed: N2: 1600 L/s
Compression ratio: N2: 3 × 105
Ultimate vacuum* (use recommended foreline pump): <1 × 10-8 mbar
Inlet flange: ISO 250F
Recommended foreline pump:> 40 m3/h
Rated speed: 33000 rpm
Front pipe flange: KF 40 NW
Startup time: <7 minutes
Operating ambient temperature: +5 °C to +40 °C
Input voltage: 100–240 Vac
Input frequency: 50-60 Hz

• The highest performance and most compact instrument available
• The first molecular pump solution specifically designed for thin film deposition applications
• The first turbo molecular pump with a fully integrated method to maximize system efficiency and uptime
• Agilent Profibus interface (optional)
• General electronic device interface with simple operation control software analog I/O signal and RS232/RS485 interface and other standard configurations
• Combined turbo molecular pump, driving device, power supply, MoniTorr, purge gas device and communication device in one

Combination VacIon Plus pumps from Agilent Technologies
HS-2 Diffusion Pump from Agilent Technologies
HS-20 Diffusion Pump from Agilent Technologies