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Elemental Analysis by Glow Discharge Mass Spectrometry (GDMS) (CAT#: STEM-EA-0214-ZJF)

Introduction

Glow Discharge Mass Spectrometry (GDMS), a very sensitive and robust analytical tool, is used to analyze elemental compositions and impurities in materials down to trace and ultra-trace levels. An Argon plasma is generated in a Glow Discharge Vacuum chamber in order to ionize solid samples, which is then used for mass spectrometric micro-analysis of elements and inorganic species. The depth-specific distribution of elements can also be evaluated with high sensitivity using flat sampling geometry in addition to full survey elemental coverage.<br />Features of GDMS analysis include:<br />• Full survey of all stable isotopes, except H<br />• Sensitivity of parts per billion or ppbw<br />• Relatively free from Matrix effects<br />• Linear calibration<br />• Robustness<br />• Direct solid sample analysis, negligible sample preparation time<br />• Depth specific distribution measurements<br />If you have any requirements or questions. Don't hesitate to contact us.




Principle

Glow Discharge Mass Spectrometry (GDMS) is a form of mass spectrometry that utilizes low current electrical discharges (milliamps) in a Glow Discharge Vacuum chamber that is filled with Argon gas to generate Argon plasma. Positively charged Argon plasma ions accelerate towards the cathode, which in the case of GDMS is the test sample. By bombarding the cathode with Argon plasma, sample atoms are released at the cathode, known as sputtering. Sputtered atoms are ionized in the plasma and extracted via the anode into the mass spectrometer for detection and spectrometric analysis. Each compound has its own unique mass spectrum. High-resolution spectrometers provide a powerful technique for analyzing all trace and ultra-trace elements in inorganic materials. Direct Current (DC), Radio Frequency (RF) and pulsed Glow Discharge systems can all be used to operate the Glow Discharge ion source. For non-conductive samples, radio frequency mode is used. By using the pulsed mode, higher energy plasma ions are generated for sputtering, resulting in a greater degree of analytical sensitivity.

Applications

Metals and alloys, aerospace, semiconductors, ceramics, environmental analysis, nuclear materials, forensics, etc.

Procedure

1. Sample preparation
2. Sample analysis by GDMS
3. Data output

Materials

• GDMS system
• Sample material: electroconductive samples, high purity materials, semiconductor materials, advanced materials (metals, alloys, graphite, electronic materials, oxides and ceramics), particulate materials, engineering coatings, etc.