Analysis of the Silicon–Cerium Oxide Interface by X-Ray Photoelectron Spectroscopy (XPS) (CAT#: STEM-XST-0108-CJ)

The principle of XPS is the simultaneous measurement of kinetic energy and number of electrons escaping when the sample is irradiated with a beam of X-ray radiation under high vacuum. Thus the XPS spectra give the information about elemental composition, empirical formula, chemical state and electronic state of the constituting elements of the material. This technique can be a qualitative, quantitative or semi-quantitative method.

Material Analysis

1. Prepare the sample.
2. Pretreat the sample: the length, width and thickness should not exceed 1 cm × 1 cm × 3 mm (the magnetic sample should be as small as possible, mark the test surface of the bulk sample or film sample); Powder sample is larger than 200 mesh, not less than 10mg, small quantity needs to be wrapped in weighing paper and then packed into the pipe to send. Polymer samples should be dried before delivery.
3. Seal the sample as soon as possible and do not touch the surface of the sample with your hands to avoid contamination by other substances.
4. Operate XPS instrument to analyze samples.
5. Collect and analyze data.

• Sample: Metal Alloys; Glass; Ceramic materials; Polymers and Plastics
Paint / Coatings; Paper and Coatings; Biomaterials and Implants
; Medical Devices; Inks; Oil Layers; Contaminant identification; Wood; Plants; Semiconductors; Composite Materials; Inorganic & Organic Compounds; Glues/ Adhesives; Surface Contaminants; Interfacial Chemistry; Catalyst Materials & More
• Equipment: X-Ray Photoelectron Spectroscopy (XPS) Instruments

1. Analyze all elements except H and He; The energy distribution of the photoemission electrons from a single energy level of the sample can be directly measured, and the information of the electron energy level structure can be directly obtained.
2. It can provide information about chemical bonds, that is, directly measure the valence electron and inner electron orbital energy levels.
3, XPS is a kind of nondestructive analysis.
4, XPS is a highly sensitive ultrafine surface analysis technology. The analysis required a very small number of samples, sample analysis depth of 0.5-10nm.